SENTECH SI 500 ICP-RIE System

SENTECH SI 500 ICP-RIE System

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The SENTECH SI 500 ICP-RIE System represents the leading edge for ICP processing in both research and industry. The system comprises the ICP plasma source PTSA, a dynamic temperature-controlled substrate electrode, a fully controlled vacuum system, and a very easy-to-operate user interface. Configurations for processing a variety of materials, including but not limited to III-V and II-VI compound semiconductors (GaAs, InP, GaN, InSb), dielectrics, quartz, glass, silicon, silicon compounds (SiC, SiGe), and metals are achievable with this flexible and modular plasma etch system.
SENTECH InstrumentsSENTECH - Experts in Plasma Process Technology and Thin Film Metrology SENTECH has over thirty years of experience developing, manufacturing, and marketing innovative capital equipment worldwide. Our advanced systems support thin film deposition, patterning, and characterisation for semiconductor technology, microsystems, photovoltaics, nanotechnology, and materials research. As a globally recognised name in advanced system development, SENTECH delivers reliable, high-quality solutions for research and industrial production. Every system is designed, manufactured, and shipped from our Berlin facility. Our dedicated teams in application, R&D, technical service, and sales work closely with customers to drive innovation, performance, and excellence across diverse technology sectors worldwide. SENTECH Gesellschaft für Sensortechnik, based in Krailling near Munich, was founded in 1986 and provides sales representation for SENTECH across Germany and parts of Europe.

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