Quantum X
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Nanoscribe's Two-Photon Grayscale Lithography (2GL ®) sets new standards in optical design engineering by redefining the design scope of refractive and diffractive microoptics. The maskless lithography enables the fabrication of topographies with ultra-smooth surfaces for rapid prototyping and mastering of freeform microoptics, microlens arrays and multi-level diffractive optical elements. Quantum X, the world’s first Two-Photon Grayscale Lithography system, advances the maskless microfabrication of extremely flat optics, such as Fresnel lenses for focused illumination or hybrid microoptics that are a mixture of refractive and diffractive elements and are fabricated in a single manufacturing process.
