Roll-to-Roll Nanoimprintlithography (R2R-NIL)

The roll-to-roll nanoimprint lithography (R2R- NIL) facilitates continuous and therefore cost-effective production of micro and nano-patterns on large- area flexible substrates. These can be used in optical, electronic, sensor, or biomimetic applications. Roll-to-roll micro- and nano-structuring thus forms the basis for the development of novel and cost effective products in Key Enabling Technology fields such as biotechnology, nanotechnology, as well as advanced materials or advanced manufacturing and production technologies. The established knowledge in design, fabrication, characterization and optimization is available to industry in combination with the roll-to-roll pilot line for the development of sustainable industry-compatible manufacturing processes.