Zenith High temperature rapid thermal annealing
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The Zenith-150 system can process samples up to 6-inch diameter at temperature up to 2000°C for one hour. It is specially developed to meet the requirements of research laboratories. The Zenith has the fastest ramp rate for high temperature annealing with 4°C/s up to 1800°C.
The system has a stainless steel water-cooled chamber. The cold wall chamber technology provides significant advantages: high process reproducibility, low memory effect, higher cooling rates.
The high temperature tungsten heaters provide enhanced temperature uniformity. The system is not compatible with oxidizing atmosphere and the installation of a turbo pump is mandatory.
Both pyrometer and thermocouple temperature measurement are standard features. The fast digital PID temperature controller provides high and stable temperature repeatability (± 1°C). The system assures accurate and repeatable thermal control across the temperature range.
The design of the process chamber provides easy loading and unloading of the substrates and the installation of the thermocouple for the pyrometer calibration.
Applications: Silicon Carbide implantation annealing, graphene by high temperature SiC sublimation, high temperature annealing
